合肥工業(yè)大學機械與汽車工程學院導師：王旭迪 正文

　　?個人簡介
　　王旭迪，男，1974年出生，博士研究生學歷，教授，1996年合肥工業(yè)大學真空技術(shù)及設備專業(yè)本科，2005年中國科學技術(shù)大學國家同步輻射實驗室工學博士。2005年-2006年英國盧瑟福國家實驗室訪問學者。已發(fā)表SCI、EI源刊論文三十余篇，申請發(fā)明專利10項。主講課程：真空物理，微納加工技術(shù)等。

　　?研究領域
　　科研方向：微納加工技術(shù)及其應用，真空檢漏與計量
　　主持項目：國家863探索導向類項目，教育部留學基金，安徽省自然科學基金，企業(yè)項目等。

　　?發(fā)表論文
　　鄭正龍; 王旭迪; 付紹軍; 聚碳酸酯基片超疏水表面的制備與表征；真空科學與技術(shù)學報；2014-03-15
　　涂呂星; 王旭迪; 逆向熱鍵合技術(shù)制作SU-8膠納流控通道；真空科學與技術(shù)學報；2013-12-15
　　李鑫; 王旭迪; 基于PDMS微結(jié)構(gòu)模板轉(zhuǎn)印技術(shù)的研究；真空科學與技術(shù)學報；2013-06-15
　　Jian Jin, Xudi Wang, Nano/micro-channel fabrication based on SU-8 using sacrificial resist etching method， Micro&Nano Letters  2012，7 1320
　　Liangjin Ge, Xudi Wang, Huoyao Chen，F(xiàn)lexible subwavelength gratings fabricated by reversal soft UV nanoimprint，CHINESE OPTICS LETTERS 10(9), 090502(2012),
　　Liangjin Ge, L. Jay Guo, Xudi Wang，Silver lines electrode patterned by transfer printing, Microelectronic Engineering 97 (2012) 289–293
　　Xiaojun Li, Xudi Wang,et al, Fabrication of size-controllable nanofluidicchannels using angled physical vapor deposition, Microelectronic Engineering vol. 98 October, 2012. p. 647-650
　　Y. Zhang, X. Wang, Y. Xing et al. One-Step Growth and Alignment of Ultralong Nanowire Arrays and Their Flexible Photodetector Devices. J. Mater. Chem., 2012, 22, 14357
　　Xiaojun Li, Yong Chen, Keqiang Qiu, Xudi Wang, Multiple centimetre-long fluidic-channels with smooth and vertical sidewall fabricated by novel NIL mould and thermal bonding, Microelectronic Engineering 98,(2012) 720–724
　　X. Wang, J. Jin, X. Li et al, Low-pressure thermal bonding, Microelectron Eng. 88 (2011) 2427–2430
　　X. Li, X.Wang, et al, Fabrication of micro/nano fluidic system combining hybrid mask-mould lithography with thermal bonding, Microelectron Eng, 87(2010), 722-755
　　X. Wang, L. Ge, J. Lu, S. Fu, Z Cui. Fabrication of Enclosed Nanofluidic channels by UV cured imprinting and thermal bonding of SU-8 Photoresist. Microelectron Eng. 86(2009), 1347-1349
　　X. Wang, Yifang Chen, Ling Wang and Zheng Cui. Fabrication of nanoimprint template in Si with high etch rate by non-switch DRIE process. Microelectron Eng. 85(2008), 1015-1017
　　X. Wang, Y. Chen, S. Fu, Z Cui. Free-standing SU-8 subwavelength gratings fabricated by UV curing imprint. Microelectron Eng. 85(2008), 910-913
　　X. wang, Y. liu,X. Xu, S. Fu, Z Cui. Reactive ion beam etching of HfO2 film and removal of sidewall of sidewall redeposition. J. Vac. Sci. Technol. A ,24 (4): 1067-1072 JUL-AUG 2006
　　X Wang, Y. Chen, S. Fu, Z Cui. High density patterns fabricated in SU-8 by UV curing nanoimprint；Microelectron Eng., 84(2007), 872-876
　　X wang, Liangjin Ge, Jingjing Lu, Shaojun Fu, High aspect ratio grating fabrication in SU-8 resist by UV-Curing nanoimprint, SPIE,Vol. 7159, (2008)
　　X. Wang, Y. Chen, S. Fu, Z Cui. Rapid nanofabrication with high density pattern with UVN30 Chemically Amplified Resist. SPIE,Vol. 6724, 67240A, (2007)
　　X. Wang, Y. Chen, S. Fu, Z Cui.Free-standing SU-8 gratings fabricated by sacrificial layer-assisted UV curing imprint. SPIE, Vol. 6827, 68271T, (2007)
　　X.Wang et al, Reactive ion beam etching of HfO2 film using Ar/CHF3 gas chemistries, SPIE,5636,577(2005)
　　Z Cui, X. Wang, Y Li, G Y Tian, High sensitive magnetically actuated micromirrors for magnetic field measurement. Sensors and Actuators A 138 (2007) 145–150
　　Chen, YF; X. Wang, et al, Nano metamaterials and photonic gratings by nanoimprint and hot embossing, IEEEConference: International Symposium on Biophotonics, Nanophotonics and Metamaterials, Date: OCT 16-18, 2006 Hangzhou PR CHINA
　　Y. Chen, L. Zheng,  X. Wang et al. Fabrication of ferromagnetic  nanoconstrictions by electron beam lithography using LOR/PMMA bilayer technique. Microelectron Eng., 84(2007), 1499-1502

　　?聯(lián)系方式
　　電子郵箱：wxudi@hfut.edu.cn

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